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The design and application of electron cyclotron resonance discharges Journal article
Asmussen Jr. J., Grotjohn T.A., Mak P., Perrin M.A.. The design and application of electron cyclotron resonance discharges[J]. IEEE Transactions on Plasma Science, 1997, 25(6), 1196-1221.
Authors:  Asmussen Jr. J.;  Grotjohn T.A.;  Mak P.;  Perrin M.A.
Favorite | TC[WOS]:47 TC[Scopus]:58 | Submit date：2019/03/01
Ecr Microwave Discharges  High-density Plasma Sources  Plasma Processing  
Experimental investigation of the matching and impressed electric field of a multipolar electron cyclotron resonance discharge Journal article
Mak P., Asmussen J.. Experimental investigation of the matching and impressed electric field of a multipolar electron cyclotron resonance discharge[J]. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 1997, 15(1), 154-168.
Authors:  Mak P.;  Asmussen J.
Favorite | TC[WOS]:11 TC[Scopus]:12 | Submit date：2019/03/01
Experimental Investigation of the Matching and Impressed Electric Fields of a Multipolar ECR Discharge Journal article
Mak, P. U., Asmussen, J.. Experimental Investigation of the Matching and Impressed Electric Fields of a Multipolar ECR Discharge[J]. J. Vac. Sci. Technol., A, 1997, 154-168.
Authors:  Mak, P. U.;  Asmussen, J.
Favorite | TC[WOS]:11 TC[Scopus]:12  IF:2.4/2.6 | Submit date：2022/09/01
Em Field In Plasma  Reactor Design And Global Plasma Model  
Investigation of Multipolar ECR Plasma Source Sensors and Models for Plasma Control Journal article
Mak, P. U., Tsai, M.-H., Natarajan, J., Wright, B., Grotjohn, T., Salam, F., Siegel, M., Asmussen, J.. Investigation of Multipolar ECR Plasma Source Sensors and Models for Plasma Control[J]. Journal of Vacuum Science & Technology A, 1996, 1894-1900.
Authors:  Mak, P. U.;  Tsai, M.-H.;  Natarajan, J.;  Wright, B.;  Grotjohn, T.; et al.
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Sensors And Plasma Processing Control Model  
Experimental Measurement of the Impressed Electric Field in a Mutlipolar Electron Cyclotron Resonance Plasma Source Conference paper
Mak, P. U., Asmussen, J.. Experimental Measurement of the Impressed Electric Field in a Mutlipolar Electron Cyclotron Resonance Plasma Source[C], 1995.
Authors:  Mak, P. U.;  Asmussen, J.
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Impressed electric field  ECR plasma source  
An Evaluation of an End Excited Electron Cyclotron Resonance Plasma Source Conference paper
Mak, P. U., Asmussen, J.. An Evaluation of an End Excited Electron Cyclotron Resonance Plasma Source[C], 1994.
Authors:  Mak, P. U.;  Asmussen, J.
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End Excited Electron Cyclotron Resonance Plasma Source  
Control of multipolar electron cyclotron resonance discharges using internal cavity impedance matching Journal article
Asmussen J., Mak P.. Control of multipolar electron cyclotron resonance discharges using internal cavity impedance matching[J]. Review of Scientific Instruments, 1994, 65(5), 1753-1756.
Authors:  Asmussen J.;  Mak P.
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Evaluation of an end excited electron cyclotron resonance plasma source Conference paper
Mak P., Asmussen J.. Evaluation of an end excited electron cyclotron resonance plasma source[C], 1994.
Authors:  Mak P.;  Asmussen J.
Favorite | TC[Scopus]:0 | Submit date：2019/03/01
Control of Multipolar ECR Discharges using Internal Impedance Matching Journal article
Asmussen, J., Mak, P. U.. Control of Multipolar ECR Discharges using Internal Impedance Matching[J]. Rev. Sci. Instrum., 1994, 65(5), 1753-1756.
Authors:  Asmussen, J.;  Mak, P. U.
Favorite | TC[WOS]:10 TC[Scopus]:12  IF:1.3/1.5 | Submit date：2022/09/01
Cavity Impedance Matching  Ecr Discharge Control  
Methods of and Problems Associated with Process Control of Microwave Discharges Conference paper
Asmussen, J., Mak, P. U.. Methods of and Problems Associated with Process Control of Microwave Discharges[C], 1993.
Authors:  Asmussen, J.;  Mak, P. U.
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Process Control of Microwave Discharges