Residential College | false |
Status | 已發表Published |
Design and robust repetitive control of a new parallel-kinematic XY piezostage for micro/nanomanipulation | |
Li Y.; Xu Q. | |
2012 | |
Source Publication | IEEE/ASME Transactions on Mechatronics |
ISSN | 10834435 |
Volume | 17Issue:6Pages:1120 |
Abstract | This paper presents mechanism and controller design procedures of a new piezoactuated flexure XY stage for micro-/nanomanipulation applications. The uniqueness of the proposed stage lies in that it possesses an integrated parallel, decoupled, and stacked kinematical structure, which owns such properties as identical dynamic behaviors in X and Y axes, decoupled input and output motion, single-input-single-output (SISO) control, high accuracy, and compact size. Finite element analysis (FEA) was conducted to predict static performance of the stage. An XY stage prototype was fabricated by wire electrical discharge machining (EDM) process from the alloy material Al7075. Based on the identified plant transfer function of the micropositioning system, an H infin robust control combined with a repetitive control (RC) was adopted to compensate for the unmodeled piezoelectric nonlinearity. The necessity of using such a combined control is also investigated. Experimental results demonstrate that the H infin plus RC scheme improves the tracking response by 67% and 28% compared to the stand-alone H infin for 1-D and 2-D periodic positioning tasks, respectively. Thus, the results illustrate the effectiveness of the proposed mechanism design and control approach. © 2012 IEEE. |
Keyword | Flexure Mechanisms Micro-/nanopositioning Motion Control Parallel Manipulators Piezoelectric Actuation |
DOI | 10.1109/TMECH.2011.2160074 |
URL | View the original |
Indexed By | SCIE |
Language | 英語English |
WOS Research Area | Automation & Control Systems ; Engineering |
WOS Subject | Automation & Control Systems ; Engineering, Manufacturing ; Engineering, Electrical & Electronic ; Engineering, Mechanical |
WOS ID | WOS:000308114900012 |
The Source to Article | Scopus |
Scopus ID | 2-s2.0-84865683560 |
Fulltext Access | |
Citation statistics | |
Document Type | Journal article |
Collection | DEPARTMENT OF ELECTROMECHANICAL ENGINEERING |
Corresponding Author | Xu Q. |
Affiliation | Department of Electromechanical Engineering, Faculty of Science and Technology, University of Macau, Macao, China |
First Author Affilication | Faculty of Science and Technology |
Corresponding Author Affilication | Faculty of Science and Technology |
Recommended Citation GB/T 7714 | Li Y.,Xu Q.. Design and robust repetitive control of a new parallel-kinematic XY piezostage for micro/nanomanipulation[J]. IEEE/ASME Transactions on Mechatronics, 2012, 17(6), 1120. |
APA | Li Y.., & Xu Q. (2012). Design and robust repetitive control of a new parallel-kinematic XY piezostage for micro/nanomanipulation. IEEE/ASME Transactions on Mechatronics, 17(6), 1120. |
MLA | Li Y.,et al."Design and robust repetitive control of a new parallel-kinematic XY piezostage for micro/nanomanipulation".IEEE/ASME Transactions on Mechatronics 17.6(2012):1120. |
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