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Design and robust repetitive control of a new parallel-kinematic XY piezostage for micro/nanomanipulation
Li Y.; Xu Q.
2012
Source PublicationIEEE/ASME Transactions on Mechatronics
ISSN10834435
Volume17Issue:6Pages:1120
Abstract

This paper presents mechanism and controller design procedures of a new piezoactuated flexure XY stage for micro-/nanomanipulation applications. The uniqueness of the proposed stage lies in that it possesses an integrated parallel, decoupled, and stacked kinematical structure, which owns such properties as identical dynamic behaviors in X and Y axes, decoupled input and output motion, single-input-single-output (SISO) control, high accuracy, and compact size. Finite element analysis (FEA) was conducted to predict static performance of the stage. An XY stage prototype was fabricated by wire electrical discharge machining (EDM) process from the alloy material Al7075. Based on the identified plant transfer function of the micropositioning system, an H infin robust control combined with a repetitive control (RC) was adopted to compensate for the unmodeled piezoelectric nonlinearity. The necessity of using such a combined control is also investigated. Experimental results demonstrate that the H infin plus RC scheme improves the tracking response by 67% and 28% compared to the stand-alone H infin for 1-D and 2-D periodic positioning tasks, respectively. Thus, the results illustrate the effectiveness of the proposed mechanism design and control approach. © 2012 IEEE.

KeywordFlexure Mechanisms Micro-/nanopositioning Motion Control Parallel Manipulators Piezoelectric Actuation
DOI10.1109/TMECH.2011.2160074
URLView the original
Indexed BySCIE
Language英語English
WOS Research AreaAutomation & Control Systems ; Engineering
WOS SubjectAutomation & Control Systems ; Engineering, Manufacturing ; Engineering, Electrical & Electronic ; Engineering, Mechanical
WOS IDWOS:000308114900012
The Source to ArticleScopus
Scopus ID2-s2.0-84865683560
Fulltext Access
Citation statistics
Document TypeJournal article
CollectionDEPARTMENT OF ELECTROMECHANICAL ENGINEERING
Corresponding AuthorXu Q.
AffiliationDepartment of Electromechanical Engineering, Faculty of Science and Technology, University of Macau, Macao, China
First Author AffilicationFaculty of Science and Technology
Corresponding Author AffilicationFaculty of Science and Technology
Recommended Citation
GB/T 7714
Li Y.,Xu Q.. Design and robust repetitive control of a new parallel-kinematic XY piezostage for micro/nanomanipulation[J]. IEEE/ASME Transactions on Mechatronics, 2012, 17(6), 1120.
APA Li Y.., & Xu Q. (2012). Design and robust repetitive control of a new parallel-kinematic XY piezostage for micro/nanomanipulation. IEEE/ASME Transactions on Mechatronics, 17(6), 1120.
MLA Li Y.,et al."Design and robust repetitive control of a new parallel-kinematic XY piezostage for micro/nanomanipulation".IEEE/ASME Transactions on Mechatronics 17.6(2012):1120.
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