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Area-Selective Growth of HfS2 Thin Films via Atomic Layer Deposition at Low Temperature Journal article
Cao, Yuanyuan, Wähler, Tobias, Park, Hyoungwon, Will, Johannes, Prihoda, Annemarie, Moses Badlyan, Narine, Fromm, Lukas, Yokosawa, Tadahiro, Wang, Bingzhe, Guldi, Dirk M., Görling, Andreas, Maultzsch, Janina, Unruh, Tobias, Spiecker, Erdmann, Halik, Marcus, Libuda, Jörg, Bachmann, Julien. Area-Selective Growth of HfS2 Thin Films via Atomic Layer Deposition at Low Temperature[J]. Advanced Materials Interfaces, 2020, 7(23), 2001493.
Authors:  Cao, Yuanyuan;  Wähler, Tobias;  Park, Hyoungwon;  Will, Johannes;  Prihoda, Annemarie; et al.
Favorite | TC[WOS]:14 TC[Scopus]:13  IF:4.3/5.2 | Submit date：2021/12/06