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Measurement of residual stress on TiN/Ti bilayer thin films using average X-ray strain combined with laser curvature and nanoindentation methods Journal article
Lei, Soichan, Huang, Jia-Hong, Chen, Haydn. Measurement of residual stress on TiN/Ti bilayer thin films using average X-ray strain combined with laser curvature and nanoindentation methods[J]. MATERIALS CHEMISTRY AND PHYSICS, 2017, 199, 185-192.
Authors:  Lei, Soichan;  Huang, Jia-Hong;  Chen, Haydn
Favorite | TC[WOS]:15 TC[Scopus]:16  IF:4.3/4.1 | Submit date:2018/10/30
Ti Interlayer  Tin  Residual Stress  Average X-ray Strain  Synchrotron X-ray