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采用氧化物陶瓷靶磁控溅射制备薄膜的方法
Patent
专利号: CN103726026B, 申请日期: 2014-01-10, 公开日期: 2016-03-02
Authors:
张振中
;
申德振
;
武晓杰
;
王双鹏
;
姜明明
; et al.
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Submit date：2022/05/21
