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Patent NumberCN111850523A
Status申請中 Pending
一种表面增强拉曼散射基底及其制备方法和应用
Application NumberCN202010683464.2
Application Date2020-07-15
Rights Holder澳门大学
潘晖; 陈明鹏; 周冰朴
Date Available2020-10-30
Country中国 China
Abstract本发明公开了一种表面增强拉曼散射基底及其制备方法和应用,首次通过水热反应大规模在金属箔上生长有竖直排列的超薄MS 2纳米片阵列材料,纳米片边缘均暴露在金属箔材料表面,说明纳米片沿竖直方向生长,具有优异的活性和良好的稳定性。并且,以业界常见的染料分子罗丹明6G(R6G)为例,本发明提供的基底的检测极限都达到了5×10‑8M,成功验证了该基底在低浓度下的检测能力,可望在大规模环境和卫生监测中得到广泛的应用。
Language中文Chinese
Open (Notice) NumberCN111850523A
IPC Classification NumberC23C18/12 ; G01N21/65
CPC Classification NumberC23C18/1204 ; G01N21/658
Patent Agent王晖 ; 刘书芝
Agency成都超凡明远知识产权代理有限公司 51258
Document TypePatent
CollectionINSTITUTE OF APPLIED PHYSICS AND MATERIALS ENGINEERING
Recommended Citation
GB/T 7714
潘晖,陈明鹏,周冰朴. 一种表面增强拉曼散射基底及其制备方法和应用. CN111850523A.
APA 潘晖., 陈明鹏., & 周冰朴 (2020-07-15). 一种表面增强拉曼散射基底及其制备方法和应用.
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