Residential College | false |
Status | 已發表Published |
Effects of rapid thermal annealing on the device characteristics of quantum well infrared photodetectors | |
Sengupta D.K.1; Fang W.1; Malin J.I.1; Curtis A.P.1; Horton T.1; Kuo H.C.1; Turnbull D.1; Lin C.H.1; Li J.1; Hsieh K.C.1; Chuang S.L.1; Adesida I.1; Feng M.1; Bishop S.G.1; Stillman G.E.1; Gibson J.M.1; Chen H.1; Mazumder J.1; Liu H.C.2 | |
1997 | |
Source Publication | Journal of Electronic Materials |
ISSN | 03615235 |
Volume | 26Issue:1Pages:43-51 |
Abstract | The effect of rapid thermal annealing (RTA) on important detector characteristics such as dark current, absolute response, noise, and detectivity is investigated for quantum-well infrared photodetectors (QWIP) operating in the 8-12 μm wavelength regime. A comprehensive set of experiments is conducted on QWIPs fabricated from both as-grown and annealed multiple-quantum-well structures. RTA is done at an anneal temperature of 850°C for 30 s using an SiO encapsulant. In general, a decrease in performance is observed for RTA QWIPs when compared to the as-grown detectors. The peak absolute response of the annealed QWIPs is lower by almost a factor of four, which results in a factor of four decrease in quantum efficiency. In addition, a degraded noise performance results in a detectivity which is five times lower than that of QWIPs using asgrown structures. Theoretical calculations of the absorption coefficient spectrum are in excellent agreement with the experimental data. |
Keyword | Dark Current Characteristics Multiple Quantum Well Infrared Photodectors (Qwips) Quantum Efficiency Rapid Thermal Annealing (Rta) Red Shift |
DOI | 10.1007/s11664-997-0132-6 |
URL | View the original |
Language | 英語English |
WOS ID | WOS:A1997WF03900010 |
Scopus ID | 2-s2.0-5844413289 |
Fulltext Access | |
Citation statistics | |
Document Type | Journal article |
Collection | University of Macau |
Affiliation | 1.University of Illinois at Urbana-Champaign 2.National Research Council Canada |
Recommended Citation GB/T 7714 | Sengupta D.K.,Fang W.,Malin J.I.,et al. Effects of rapid thermal annealing on the device characteristics of quantum well infrared photodetectors[J]. Journal of Electronic Materials, 1997, 26(1), 43-51. |
APA | Sengupta D.K.., Fang W.., Malin J.I.., Curtis A.P.., Horton T.., Kuo H.C.., Turnbull D.., Lin C.H.., Li J.., Hsieh K.C.., Chuang S.L.., Adesida I.., Feng M.., Bishop S.G.., Stillman G.E.., Gibson J.M.., Chen H.., Mazumder J.., & Liu H.C. (1997). Effects of rapid thermal annealing on the device characteristics of quantum well infrared photodetectors. Journal of Electronic Materials, 26(1), 43-51. |
MLA | Sengupta D.K.,et al."Effects of rapid thermal annealing on the device characteristics of quantum well infrared photodetectors".Journal of Electronic Materials 26.1(1997):43-51. |
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