Residential College | false |
Status | 已發表Published |
Dielectric properties of metal-organic chemical vapor deposited highly textured Pb(ScTa)1-xTixO3 (x=0-0.3) relaxor ferroelectric thin films on LaNiO3 electrode buffered Si | |
Lin C.H.2; Lee S.W.2; Chen H.2; Wu T.B.1 | |
1999-10-18 | |
Source Publication | Applied Physics Letters |
ISSN | 00036951 |
Volume | 75Issue:16Pages:2485-2487 |
Abstract | Highly (100) textured Pb(ScTa)TiO (x=0-0.3) thin films were grown on LaNiO/Pt/Ti electrode-coated Si substrate using metal-organic chemical vapor deposition at 685°C. Ti addition was introduced to modify the dielectric properties. Diffuse phase transition, typical of relaxor ferroelectrics was noticed. As Ti content increased from 0% to 30%, the phase transition temperature (T) gradually shifted from -10 to 120°C with the dielectric constant at T increased from 1397 to 1992 (1 kHz). Loss tangent values are generally below 0.025. © 1999 American Institute of Physics. |
DOI | 10.1063/1.125056 |
URL | View the original |
Language | 英語English |
WOS ID | WOS:000083111100048 |
Scopus ID | 2-s2.0-0003179828 |
Fulltext Access | |
Citation statistics | |
Document Type | Journal article |
Collection | University of Macau |
Affiliation | 1.National Tsing Hua University 2.University of Illinois at Urbana-Champaign |
Recommended Citation GB/T 7714 | Lin C.H.,Lee S.W.,Chen H.,et al. Dielectric properties of metal-organic chemical vapor deposited highly textured Pb(ScTa)1-xTixO3 (x=0-0.3) relaxor ferroelectric thin films on LaNiO3 electrode buffered Si[J]. Applied Physics Letters, 1999, 75(16), 2485-2487. |
APA | Lin C.H.., Lee S.W.., Chen H.., & Wu T.B. (1999). Dielectric properties of metal-organic chemical vapor deposited highly textured Pb(ScTa)1-xTixO3 (x=0-0.3) relaxor ferroelectric thin films on LaNiO3 electrode buffered Si. Applied Physics Letters, 75(16), 2485-2487. |
MLA | Lin C.H.,et al."Dielectric properties of metal-organic chemical vapor deposited highly textured Pb(ScTa)1-xTixO3 (x=0-0.3) relaxor ferroelectric thin films on LaNiO3 electrode buffered Si".Applied Physics Letters 75.16(1999):2485-2487. |
Files in This Item: | There are no files associated with this item. |
Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.
Edit Comment