Effect of deposition temperature and post-heat-treatment condition on the characteristics of (100)-self-orientation LaNiO3 films prepared by RF magnetron sputter deposition

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	Effect of deposition temperature and post-heat-treatment condition on the characteristics of (100)-self-orientation LaNiO3 films prepared by RF magnetron sputter deposition
	Takahashi K.1; Suzuki M.1; Oikawa T.1; Chen H.3; Funakubo H.1
	2005
Source Publication	Materials Research Society Symposium Proceedings
Volume	833
Pages	35-40
Abstract	La-Ni-O films were deposited at deposition temperature ranging from 250 to 540°C by rf magnetron sputter deposition. The effects of deposition temperature and the following heat-treatment condition on the constituent phases and characteristics of LaNiO films were investigated. LaNiO phase was obtained at the deposition temperature of 250 and 360°C, while La-rich phase of LaNiO was appeared above 540°C. Crystalline phases of resultant films after the following heat-treatment strongly depended on the partial pressure of oxygen gas in ambience, i.e., in case of the heat-treatment at 800°C, diffraction peaks originated from LaNiO phase disappeared on XRD patterns in pure nitrogen gas ambience, while impurity peaks of NiO appeared in oxygen-excess (>50%) ambience. As a result, LaNiO films with high crystallinity and the same lattice parameter as the bulk one were obtained in the deposition at 360°C followed by the heat-treatment at 700°C in air. © 2005 Materials Research Society.
URL	View the original
Language	英語English
Fulltext Access	View Full-Text via Scopus
Document Type	Conference paper
Collection	University of Macau
Affiliation	1.Tokyo Institute of Technology 2.Japan Science and Technology Agency 3.City University of Hong Kong
Recommended Citation GB/T 7714	Takahashi K.,Suzuki M.,Oikawa T.,et al. Effect of deposition temperature and post-heat-treatment condition on the characteristics of (100)-self-orientation LaNiO3 films prepared by RF magnetron sputter deposition[C], 2005, 35-40.
APA	Takahashi K.., Suzuki M.., Oikawa T.., Chen H.., & Funakubo H. (2005). Effect of deposition temperature and post-heat-treatment condition on the characteristics of (100)-self-orientation LaNiO3 films prepared by RF magnetron sputter deposition. Materials Research Society Symposium Proceedings, 833, 35-40.

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