Residential College | false |
Status | 已發表Published |
Growth kinetics of GaAs nanoneedles on silicon and sapphire substrates | |
Dubrovskii V.G.1; Nazarenko M.V.1; Chuang L.C.2; Ko W.S.2; Ng K.W.2; Chang-Hasnain C.2 | |
2011-04-11 | |
Source Publication | Applied Physics Letters |
ISSN | 00036951 |
Volume | 98Issue:15 |
Abstract | We study theoretically and experimentally the time evolution of GaAs nanoneedles grown by metal organic chemical vapor deposition on silicon and sapphire substrates. A theoretical model is presented which provides explicitly the nanoneedle length as a function of growth time under the assumption of a fixed aspect ratio. Experimental data confirms that the aspect ratio remains approximately constant during the growth. From fitting the experimental length-time dependences, we estimate the effective arrival rates and the Ga diffusion lengths as being 3.5 nm/min and 80 nm on the silicon and 2.9 nm/min and 400 nm on the sapphire substrates, respectively. © 2011 American Institute of Physics. |
DOI | 10.1063/1.3575556 |
URL | View the original |
Language | 英語English |
WOS ID | WOS:000289580800061 |
Scopus ID | 2-s2.0-79954593520 |
Fulltext Access | |
Citation statistics | |
Document Type | Journal article |
Collection | University of Macau |
Affiliation | 1.St Petersburg National Research Academic University of the Russian Academy of Sciences 2.University of California, Berkeley 3.Ioffe Institute |
Recommended Citation GB/T 7714 | Dubrovskii V.G.,Nazarenko M.V.,Chuang L.C.,et al. Growth kinetics of GaAs nanoneedles on silicon and sapphire substrates[J]. Applied Physics Letters, 2011, 98(15). |
APA | Dubrovskii V.G.., Nazarenko M.V.., Chuang L.C.., Ko W.S.., Ng K.W.., & Chang-Hasnain C. (2011). Growth kinetics of GaAs nanoneedles on silicon and sapphire substrates. Applied Physics Letters, 98(15). |
MLA | Dubrovskii V.G.,et al."Growth kinetics of GaAs nanoneedles on silicon and sapphire substrates".Applied Physics Letters 98.15(2011). |
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