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Growth kinetics of GaAs nanoneedles on silicon and sapphire substrates
Dubrovskii V.G.1; Nazarenko M.V.1; Chuang L.C.2; Ko W.S.2; Ng K.W.2; Chang-Hasnain C.2
2011-04-11
Source PublicationApplied Physics Letters
ISSN00036951
Volume98Issue:15
Abstract

We study theoretically and experimentally the time evolution of GaAs nanoneedles grown by metal organic chemical vapor deposition on silicon and sapphire substrates. A theoretical model is presented which provides explicitly the nanoneedle length as a function of growth time under the assumption of a fixed aspect ratio. Experimental data confirms that the aspect ratio remains approximately constant during the growth. From fitting the experimental length-time dependences, we estimate the effective arrival rates and the Ga diffusion lengths as being 3.5 nm/min and 80 nm on the silicon and 2.9 nm/min and 400 nm on the sapphire substrates, respectively. © 2011 American Institute of Physics.

DOI10.1063/1.3575556
URLView the original
Language英語English
WOS IDWOS:000289580800061
Scopus ID2-s2.0-79954593520
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Document TypeJournal article
CollectionUniversity of Macau
Affiliation1.St Petersburg National Research Academic University of the Russian Academy of Sciences
2.University of California, Berkeley
3.Ioffe Institute
Recommended Citation
GB/T 7714
Dubrovskii V.G.,Nazarenko M.V.,Chuang L.C.,et al. Growth kinetics of GaAs nanoneedles on silicon and sapphire substrates[J]. Applied Physics Letters, 2011, 98(15).
APA Dubrovskii V.G.., Nazarenko M.V.., Chuang L.C.., Ko W.S.., Ng K.W.., & Chang-Hasnain C. (2011). Growth kinetics of GaAs nanoneedles on silicon and sapphire substrates. Applied Physics Letters, 98(15).
MLA Dubrovskii V.G.,et al."Growth kinetics of GaAs nanoneedles on silicon and sapphire substrates".Applied Physics Letters 98.15(2011).
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