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Epitaxial growth of graphene on silicon carbide (SiC)
Huang H.1; Chen S.2; Wee A.T.S.1; Chen W.1
2014
Source PublicationGraphene: Properties, Preparation, Characterisation and Devices
PublisherElsevier Ltd.
Pages3-26
Abstract

This chapter provides an overview of the epitaxial growth of graphene films on various silicon carbide (SiC) substrates, their growth mechanism, and atomic scale characterization. The chapter focuses on the growth of epitaxial graphene (EG) via the thermal decomposition of single-crystal SiC in ultrahigh vacuum (UHV) and under ambient pressure. There is also a discussion of the thermal decomposition of polycrystalline SiC thin films and the intercalation methods used to produce EG. © 2014 Woodhead Publishing Limited. All rights reserved.

KeywordEpitaxial Graphene Silicon Carbide Thermal Decomposition
DOI10.1533/9780857099334.1.3
URLView the original
Language英語English
ISBN9780857095084;
WOS IDWOS:000341776400002
Scopus ID2-s2.0-84903013858
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Document TypeBook chapter
CollectionUniversity of Macau
Affiliation1.National University of Singapore
2.Nanyang Technological University
Recommended Citation
GB/T 7714
Huang H.,Chen S.,Wee A.T.S.,et al. Epitaxial growth of graphene on silicon carbide (SiC)[M]. Graphene: Properties, Preparation, Characterisation and Devices:Elsevier Ltd., 2014, 3-26.
APA Huang H.., Chen S.., Wee A.T.S.., & Chen W. (2014). Epitaxial growth of graphene on silicon carbide (SiC). Graphene: Properties, Preparation, Characterisation and Devices, 3-26.
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