Status | 已發表Published |
Fabrication of p-type nitrogen-doped MgZnO by depressing N-related donors | |
Wei Z.P.1; Yao B.1; Li Y.F.1; Shen D.Z.1; Lu Y.M.1; Zhang Z.Z.1; Li B.H.1; Zheng C.J.1; Wang X.H.1; Zhang J.Y.1; Zhao D.X.1; Fan X.W.1; Tang Z.K.4 | |
2008-11-01 | |
Source Publication | Journal of the Korean Physical Society |
Volume | 53 |
Issue | 5 PART 2 |
Pages | 3043-3046 |
Abstract | Wurtzite nitrogen-doped MgZnO (MgZnO:N) films were grown on c-plane sapphire by using plasma-assisted molecular beam epitaxy with radical NO as the oxygen source and nitrogen dopant. P-type conduction of MgZnO:N was obtained by decreasing the donor defects ((N), V, etc.) through annealing, revealing a hole concentration of 6.1 × 10 cm and a mobility of 6.42 cm/Vs. Furthermore, as-grown p-type films with a hole concentration of 1 × 10 cm and a mobility of 3 cm/Vs were obtained by decreasing the (N) double donor defect through control of the plasma conditions. ZnMgO:N/ZnO p-n junctions were obtained by using these p-type films. Diode-like, rectifying I-V characteristics with a threshold voltage of about 5 V and a different reverse leakage current were observed at room temperature. |
Keyword | N doping P-MBE ZnMgO/ZnO p-n junction |
URL | View the original |
Language | 英語English |
Fulltext Access | |
Document Type | Conference paper |
Collection | INSTITUTE OF APPLIED PHYSICS AND MATERIALS ENGINEERING |
Affiliation | 1.Changchun Institute of Optics Fine Mechanics and Physics Chinese Academy of Sciences 2.Chinese Academy of Sciences 3.Changchun University of Science and Technology 4.Hong Kong University of Science and Technology |
Recommended Citation GB/T 7714 | Wei Z.P.,Yao B.,Li Y.F.,et al. Fabrication of p-type nitrogen-doped MgZnO by depressing N-related donors[C], 2008, 3043-3046. |
APA | Wei Z.P.., Yao B.., Li Y.F.., Shen D.Z.., Lu Y.M.., Zhang Z.Z.., Li B.H.., Zheng C.J.., Wang X.H.., Zhang J.Y.., Zhao D.X.., Fan X.W.., & Tang Z.K. (2008). Fabrication of p-type nitrogen-doped MgZnO by depressing N-related donors. Journal of the Korean Physical Society, 53(5 PART 2), 3043-3046. |
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