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Sensitive elemental analysis by ArF laser-induced fluorescence of laser ablation plumes: Elucidation of the fluorescence mechanism
Ho S.K.1; Cheung N.H.1
2005-12-01
Source PublicationApplied Physics Letters
ISSN00036951
Volume87Issue:26Pages:1-3
Abstract

Numerous atomic analytes in plumes produced by pulsed-laser ablation fluoresced upon ArF laser irradiation. The likely mechanism was photoexcitation to levels near the ionization limit. These levels were dense and were probably broadened by the extreme plume density to allow efficient absorption of 193 nm photons. The excited atoms relaxed to intermediate states as the plume expanded. Interparticle interaction weakened and transitions from these states produced sharp spectral lines for elemental analysis. This ArF-induced fluorescence technique was orders of magnitude more sensitive than laser-induced plasma spectroscopy. © 2005 American Institute of Physics.

DOI10.1063/1.2149983
URLView the original
Language英語English
WOS Research AreaPhysics
WOS SubjectPhysics, Applied
WOS IDWOS:000234338700106
PublisherAMER INST PHYSICS, 1305 WALT WHITMAN RD, STE 300, MELVILLE, NY 11747-4501 USA
Scopus ID2-s2.0-29744469429
Fulltext Access
Citation statistics
Document TypeJournal article
CollectionUniversity of Macau
Affiliation1.Hong Kong Baptist University
2.Universidade de Macau
Recommended Citation
GB/T 7714
Ho S.K.,Cheung N.H.. Sensitive elemental analysis by ArF laser-induced fluorescence of laser ablation plumes: Elucidation of the fluorescence mechanism[J]. Applied Physics Letters, 2005, 87(26), 1-3.
APA Ho S.K.., & Cheung N.H. (2005). Sensitive elemental analysis by ArF laser-induced fluorescence of laser ablation plumes: Elucidation of the fluorescence mechanism. Applied Physics Letters, 87(26), 1-3.
MLA Ho S.K.,et al."Sensitive elemental analysis by ArF laser-induced fluorescence of laser ablation plumes: Elucidation of the fluorescence mechanism".Applied Physics Letters 87.26(2005):1-3.
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