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Nonsymmorphic symmetry protected nodal lines in layered topological semimetal Ta3GeTe6
Ma, Xiang1; Wang, Kaipu2; Cao, Jin3; Zheng, Bo1; Zhao, Yiwei4; Wang, Changlong1; Tan, Haige1; Li, Ruimin1; Wu, Junjie1; Xi, Chuanying5; Wang, Lan6; Yang, Shengyuan A.3; Liu, Zhongkai2; Lu, Yalin1,7; Xiang, Bin1,7
2024-04-08
Source PublicationApplied Physics Letters
ISSN0003-6951
Volume124Issue:15Pages:153103
Abstract

Topological semimetals have garnered significant attention due to their distinctive physical properties. However, the ideal material platforms for studying these phenomena remain limited. Here, we report the synthesis and nontrivial topological properties of high-quality van der Waals material TaGeTe. Angle-resolved photoemission spectroscopy studies performed systematically on the as-grown TaGeTe single crystal along different high-symmetry directions reveal the formation of two nodal lines located near 0.07 and 0.55 eV below E along the loop X-U-R-S, which arises from band crossings protected by nonsymmorphic symmetry. Furthermore, the nodal lines near the Fermi level along the S-R and S-X directions exhibit a flat feature. The discovery of this material enriches the family of topological nodal line semimetals and provides a promising platform for future investigations into exotic electronic correlation phenomena and potential device applications.

DOI10.1063/5.0201889
URLView the original
Indexed BySCIE
Language英語English
WOS Research AreaPhysics
WOS SubjectPhysics, Applied
WOS IDWOS:001199852000011
PublisherAIP Publishing, 1305 WALT WHITMAN RD, STE 300, MELVILLE, NY 11747-4501
Scopus ID2-s2.0-85190542998
Fulltext Access
Citation statistics
Document TypeJournal article
CollectionINSTITUTE OF APPLIED PHYSICS AND MATERIALS ENGINEERING
Corresponding AuthorLiu, Zhongkai; Lu, Yalin; Xiang, Bin
Affiliation1.Department of Materials Science and Engineering, CAS Key Lab of Materials for Energy Conversion, Anhui Laboratory of Advanced Photon Science and Technology, University of Science and Technology of China, Hefei, 230026, China
2.School of Physical Science and Technology, ShanghaiTech University, Shanghai, 201210, China
3.Research Laboratory for Quantum Materials, IAPME, University of Macau, Macao
4.State Key Laboratory for Mechanical Behavior of Materials, Xi'an Jiaotong University, Xi'an, Shaanxi, 710049, China
5.Anhui Province Key Laboratory of Condensed Matter Physics at Extreme Conditions, High Magnetic Field Laboratory, Hefei Institutes of Physical Sciences, Chinese Academy of Science, Hefei, 230031, China
6.Lab of Low Dimensional Magnetism and Spintronic Devices, School of Physics, Hefei University of Technology, Hefei, Anhui, 230009, China
7.Hefei National Laboratory, University of Science and Technology of China, Hefei, 230088, China
Recommended Citation
GB/T 7714
Ma, Xiang,Wang, Kaipu,Cao, Jin,et al. Nonsymmorphic symmetry protected nodal lines in layered topological semimetal Ta3GeTe6[J]. Applied Physics Letters, 2024, 124(15), 153103.
APA Ma, Xiang., Wang, Kaipu., Cao, Jin., Zheng, Bo., Zhao, Yiwei., Wang, Changlong., Tan, Haige., Li, Ruimin., Wu, Junjie., Xi, Chuanying., Wang, Lan., Yang, Shengyuan A.., Liu, Zhongkai., Lu, Yalin., & Xiang, Bin (2024). Nonsymmorphic symmetry protected nodal lines in layered topological semimetal Ta3GeTe6. Applied Physics Letters, 124(15), 153103.
MLA Ma, Xiang,et al."Nonsymmorphic symmetry protected nodal lines in layered topological semimetal Ta3GeTe6".Applied Physics Letters 124.15(2024):153103.
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