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Growth and visible photoluminescence of highly oriented (1 0 0) zinc oxide film synthesized on silicon by plasma immersion ion implantation
Mei, YF; Fu, RKY; Siu, GG; Chu, PK; Li, ZM; Yang, CL; Ge, WK; TANG ZIKANG; Cheung, WY; Wong, SP
2005-08
Source PublicationMaterials science in semiconductor processing
Document TypeJournal article
CollectionINSTITUTE OF APPLIED PHYSICS AND MATERIALS ENGINEERING
Recommended Citation
GB/T 7714
Mei, YF,Fu, RKY,Siu, GG,et al. Growth and visible photoluminescence of highly oriented (1 0 0) zinc oxide film synthesized on silicon by plasma immersion ion implantation[J]. Materials science in semiconductor processing, 2005.
APA Mei, YF., Fu, RKY., Siu, GG., Chu, PK., Li, ZM., Yang, CL., Ge, WK., TANG ZIKANG., Cheung, WY., & Wong, SP (2005). Growth and visible photoluminescence of highly oriented (1 0 0) zinc oxide film synthesized on silicon by plasma immersion ion implantation. Materials science in semiconductor processing.
MLA Mei, YF,et al."Growth and visible photoluminescence of highly oriented (1 0 0) zinc oxide film synthesized on silicon by plasma immersion ion implantation".Materials science in semiconductor processing (2005).
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