Residential College | false |
Status | 已發表Published |
Fabrication and oxidation of amorphous Zr-based alloy for imprint lithography | |
Li, M; Luo, W; Xu, J; Zhang, J; Ng, K. W.; Cheng, X | |
2022 | |
Source Publication | Microelectronic Engineering |
ISSN | 0167-9317 |
Pages | 111722-111722 |
Abstract | As nanoimprint lithography provides promising potential in industrial manufacture, it is highly desirable to fabricate a flexible mold with good surface hardness and corrosion resistance. In this work, a nano-patterned template with amorphous surface was fabricated by magnetron sputtering and electrodeposition. The glassy structure imparted high affinity to oxygen with selective oxidation of Zr, Cu, and Al atoms in ambient atmosphere. These nanoimprint templates, having excellent flexibility, surface hardness, and environmental stability, combined with strong capability for constructing nanopatterns, are advantageous for high-resolution imprint lithography with good industrialization prospects. |
Keyword | Imprint Lithography Sputtering Electrodeposition Oxidation |
DOI | 10.1016/j.mee.2022.111722 |
URL | View the original |
Language | 英語English |
The Source to Article | PB_Publication |
Fulltext Access | |
Citation statistics | |
Document Type | Journal article |
Collection | INSTITUTE OF APPLIED PHYSICS AND MATERIALS ENGINEERING |
Corresponding Author | Li, M; Cheng, X |
Recommended Citation GB/T 7714 | Li, M,Luo, W,Xu, J,et al. Fabrication and oxidation of amorphous Zr-based alloy for imprint lithography[J]. Microelectronic Engineering, 2022, 111722-111722. |
APA | Li, M., Luo, W., Xu, J., Zhang, J., Ng, K. W.., & Cheng, X (2022). Fabrication and oxidation of amorphous Zr-based alloy for imprint lithography. Microelectronic Engineering, 111722-111722. |
MLA | Li, M,et al."Fabrication and oxidation of amorphous Zr-based alloy for imprint lithography".Microelectronic Engineering (2022):111722-111722. |
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